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Staff Accomplishments

Team Wins U.S. Patent for Treating Hazardous Halogen-Containing Gas

February 2006
Congratulations to ETD's Gary Josephson and Kenneth Rappe and NSD's Chris Aardahl for their recent U.S. patent award (#6,962,679). This invention is a process and apparatus for treating gases containing halogens, particularly fluorine. Manufacturing of computer chips uses fluorine radicals to etch the small lines in the chips. Fluorine gas from the etching process is a highly hazardous environmental contaminant and must be removed or reduced from emission sources. This invention provides an improved method to remove fluorine from the process discharge. The invention is based upon PNNLís nonthermal plasma technology and a radical chain reaction. Congratulations again, team!

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